The Science and Technology of Nanolithography

6 EC

Semester 2, period 6

5354NALI6Y

Owner Master Physics and Astronomy (joint degree)
Coordinator prof. dr. P.C.M. Planken
Part of Master Physics and Astronomy, track Advanced Matter and Energy Physics,

Course manual 2019/2020

Course content

In state-of-the-art Nanolithography, a mask containing the layout of a computer chip is imaged, using (Extreme)ultraviolet (EUV) light, onto a thin layer of photo-resist on top of a semiconductor wafer from which the computer chips are fabricated. In this MSc course we will follow the path that the light in state-of-the-art nanolithography takes from the beginning, where it is generated, to the end, where it is absorbed and causes chemical changes.

We will cover the surprisingly rich physics behind some of the fundamental processes occurring in Nanolithography. These range from the interaction of intense laser light with metals, the generation of plasma's, the generation of EUV light in plasmas, the creation of good mirrors out of badly reflecting materials and the generation of high-order harmonics.

Study materials

Other

  • Lecture notes.

Objectives

  • the student is able to reproduce and apply new, advanced physics concepts from areas relevant for nanolithography such as advanced optics, plasma physics, surface science, photochemistry, and new concepts in metrology.
  • the student is able to apply and combine basic and advanced physic concepts (e.g. also from BSc courses on solid state physics; atomic, molecular and optical physics) to analyze and solve concrete problems that transcend individual physics domains in state-of-the-art nanolithography, specifically in the nanolithography fields of: Optics for extreme ultraviolet light; Laser-driven plasma light sources; Optical inspection and metrology; Thin films and surfaces and their interactions with light
  • the scientific challenges and fundamental limits facing physicists performing research in the field of nano-lithography

Teaching methods

  • Lecture
  • Self-study

The course consists of lectures of 45 minutes followed by exercise sessions (45 minutes) where exercises are done and discussed. The exact format of the exercise session, for example, doing exercises on the spot, or discussing exercises done in the course of regular homework, will also depend on student's preferences. Different sub-topics within the course will be given by different teachers, each an expert on a sub-topic.

Learning activities

Activity

Number of hours

Zelfstudie

168

Attendance

Requirements concerning attendance (OER-B).

  • In addition to, or instead of, classes in the form of lectures, the elements of the master’s examination programme often include a practical component as defined in article A-1.2 of part A. The course catalogue contains information on the types of classes in each part of the programme. Attendance during practical components is mandatory.

    • Assessment

    Item and weight Details

    Final grade

    1 (100%)

    Tentamen

    Fraud and plagiarism

    The 'Regulations governing fraud and plagiarism for UvA students' applies to this course. This will be monitored carefully. Upon suspicion of fraud or plagiarism the Examinations Board of the programme will be informed. For the 'Regulations governing fraud and plagiarism for UvA students' see: www.student.uva.nl

    Course structure

    Weeknummer Onderwerpen Studiestof
    1
    2
    3
    4

    Timetable

    The schedule for this course is published on DataNose.

    Additional information

    Recommended prior knowledge: The course requires that you have a bachelor level of understanding of optics, solid-state physics and quantum mechanics.

    NB The course will be given by scientists working parttime or fulltime at the newly established Advanced Center for Nanolithography, ARCNL.

    Contact information

    Coordinator

    • prof. dr. P.C.M. Planken

    Staff

    Staff