The Science and Technology of Nanolithography

Course manual 2024/2025

Course content

In state-of-the-art Nanolithography, a mask containing the layout of a computer chip is imaged, using (Extreme)ultraviolet (EUV) light, onto a thin layer of photo-resist on top of a semiconductor wafer from which the computer chips are fabricated. In this MSc course we will follow the path that the light in state-of-the-art nanolithography takes from the beginning, where it is generated, to the end, where it is absorbed and causes chemical changes.

We will cover the surprisingly rich physics behind some of the fundamental processes occurring in Nanolithography. These range from the interaction of intense laser light with metals, the generation of plasma's, the generation of EUV light in plasmas, the creation of good mirrors out of badly reflecting materials and the interaction of photoresist with (E)UV light.

Study materials

Other

• Lecture notes.

Objectives

• The student is able to reproduce and apply new, advanced physics concepts from areas relevant for nanolithography such as advanced optics, plasma physics, surface science, photochemistry, and new concepts in metrology.
• The student is able to apply and combine basic and advanced physic concepts (e.g. also from BSc courses on solid state physics; atomic, molecular and optical physics) to analyze and solve concrete problems that transcend individual physics domains in state-of-the-art nanolithography, specifically in the nanolithography fields of: Optics for extreme ultraviolet light; Laser-driven plasma light sources; Optical inspection and metrology; Thin films and surfaces and their interactions with light.
• The scientific challenges and fundamental limits facing physicists performing research in the field of nano-lithography.

Teaching methods

• Lecture
• Self-study
• Presentation/symposium

The course consists of lectures of 45 minutes followed by exercise sessions (45 minutes) where exercises are done and discussed. The exact format of the exercise session, for example, doing exercises on the spot, or discussing exercises done in the course of regular homework, will also depend on student's preferences. Different sub-topics within the course will be given by different teachers, each an expert on a sub-topic.
We are currently also looking into the possibility to pay a visit to the company ASML with interested students at the end of the course.

Learning activities

Attendance

Requirements concerning attendance (OER-B).

Assessment

Graded assignments form 40 % of the final grade. The exam grade forms 60 % of the final grade.

Assignments

Homework

• Can be presentation, exercises, ....

Graded assignments form 40 % of the final grade. The exam grade forms 60 % of the final grade.

Fraud and plagiarism

The 'Regulations governing fraud and plagiarism for UvA students' applies to this course. This will be monitored carefully. Upon suspicion of fraud or plagiarism the Examinations Board of the programme will be informed. For the 'Regulations governing fraud and plagiarism for UvA students' see: www.student.uva.nl

Course structure

Additional information

Recommended prior knowledge: The course requires that you have a bachelor level of understanding of optics, solid-state physics and quantum mechanics.

NB The course will be given by scientists working parttime or fulltime at the newly established Advanced Center for Nanolithography, ARCNL.

Contact information

Coordinator

• prof. dr. P.C.M. Planken